A new PP-TOFMS (plasma profiling time-of-flight mass spectrometry) instrument offers broad capabilities – not only can it detect any element, but the technique is nearly equally sensitive to all elements, except hydrogen, carbon, nitrogen, and oxygen, since the ionization process is completely separated from the sputtering process. This permits a standard-free, instantaneous semi-quantification analysis of a sample with an atomic concentration range spanning orders of magnitudes in a single measurement.
The Ultra Fast Depth Profiling TOFMS instrument is compact and provides chemical composition as a function of depth of solid materials.
The depth profiling technique involves a high ion density glow discharge plasma source that erodes and ionizes sample material, coupled to an ultra fast orthogonal TOFMS. Since the sample does not need to be transferred to a high vacuum chamber, pre-analysis time is greatly reduced.
The use of a radio frequency excitation signal allows analysis of all types of materials ranging from conductive to non-conductive (e.g. thin films on thick glass substrates can be analyzed in just a few minutes) and from inorganic to hybrid.
Minimal sample preparation, coupled with a ‘no UHV sample transfer environment,’ also contributes to the high speed of analysis and makes PP-TOFMS a user-friendly tool that is easily implemented in a variety of scientific and engineering applications. HORIBA Scientific
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