Providing the sub-nanometer resolution and enhanced contrast needed for precise measurements on beam-sensitive materials in advanced semiconductor manufacturing and materials science applications, the new Verios XHR SEM high-resolution scanning electron microscope will extend sub-nanometer imaging and characterization to novel materials being developed today. Providing precise measurements at the 22nm technology node and below this SEM captures high resolution, high contrast images, without the need to transition to TEM or other imaging techniques.
It allows researchers to switch between various operating conditions, maintain sample cleanliness, and obtain sub-nanometer resolution at any accelerating voltage from 1 kV to 30 kV.
The optimized signal collection and advanced filtering abilities provide higher and flexible contrast generation, and allow for a wide range of samples to be investigated.
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